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Subject : analytical chemistry

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Nucleation and growth of C54 grains into C49 TiSi2 thin films monitored by micro-Raman imaging

Authors : C. Spinella; S. Privitera; M. G. Grimaldi ...

Subjects: Materials science; Annealing (metallurgy); Nucleation

Source: Scopus-Elsevier

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C49-C54 phase transition in nanometric titanium disilicide grains

Authors : C. Bongiorno; M. G. Grimaldi; M. S. Alessandrino

Subjects: Phase transition; Materials science; Annealing (metallurgy)

Source: Journal of applied physics 95 (2004): 1977–1985.info:cnr-pdr/source/autori:Alessandrino, MS; Privitera, S; Grimaldi, MG; Bongiorno, C; Pannitteri, S; La Via, F/titolo:

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Investigations of transient phase formation in Ti/Si thin film reaction

Authors : Bernard Chenevier; I. Matko; Odette Chaix-Pluchery ...

Subjects: Materials science; Annealing (metallurgy); Analytical chemistry

Source: Journal of Applied PhysicsJournal of Applied Physics, American Institute of Physics, 2004, 96 (1), pp.361. ⟨10.1063/1.1759395⟩Journal of applied physics 96 (2004): 361–368.

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Characterization of ovatoxin-h, a new ovatoxin analog, and evaluation of chromatographic columns for ovatoxin analysis and purification

Authors : Véronique Séchet; Manoella Sibat; Charline Brissard

Subjects: Cell Extracts; 0106 biological sciences; Resolution (mass spectrometry)

Source: Journal of Chromatography A (0021-9673) (Elsevier), 2015-04-03, Vol. 1388, P. 87-101

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S-nitrosylation influences the structure and DNA binding activity of AtMYB30 transcription factor from Arabidopsis thaliana

Authors : Ricardo Alexandre Delena; Raúl Cassia; Carolina Pereira Tavares

Subjects: DNA, Plant; Protein family; MYB transcription factors

Source: Biochimica et Biophysica Acta (BBA) - Proteins and Proteomics. (4):810-817

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Interfacial reactions of Ti/ and Zr/Si1−xGex/Si contacts with rapid thermal annealing

Authors : Yukio Yasuda; Osamu Nakatsuka; Shigeaki Zaima

Subjects: Materials science; Materials Chemistry; Metals and Alloys

Source: Thin Solid Films. 373:73-78

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Frontiers in Crystallography with Synchrotron Radiation. Utilizing of Various Properties of Synchrotron Radiation. Characterization of Thin Films with X-ray Total Reflection Technology

Authors : Yoshimasa Horii; Satoshi Komiya; Hirofumi Tomita

Subjects: Diffraction; Total internal reflection; Carbon film

Source: Nihon Kessho Gakkaishi. 39:89-93

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X-ray scanning photoemission microscopy of titanium silicides and Al-Cu interconnects

Authors : G. F. Lorusso; P. J. Batson; Franco Cerrina

Subjects: Microscope; business.industry; Analytical chemistry

Source: The 1998 international conference on characterization and metrology for ULSI technology.

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Initial growth of SrTiO3 on Sr/Si(001) studied by scanning tunneling microscope

Authors : Qiu Yun-Fei; Wang Bing; Du Wen-Han

Subjects: Materials science; law; Annealing (metallurgy)

Source: Acta Physica Sinica. 60:036801

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Resistivity and morphology of TiSi2formed on Xe+‐implanted polycrystalline silicon

Authors : Hiroki Kuwano; J. R. Phillips; James W. Mayer

Subjects: Materials science; Physics and Astronomy (miscellaneous); Silicon

Source: Applied Physics Letters. 56:440-442

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